S. Brad
Herner
Publicacions en què col·labora amb S. Brad Herner (5)
1998
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Boron-enhanced-diffusion of boron from ultra-low-energy boron implantation
SILICON MATERIALS SCIENCE AND TECHNOLOGY, VOLS 1 AND 2
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Damage, defects and diffusion from ultra-low energy (0-5 keV) ion implantation of silicon
Materials Science in Semiconductor Processing, Vol. 1, Núm. 1, pp. 17-25
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Ion mass influence on transient enhanced diffusion and boron clustering in silicon: Deviation from the "+1" model
Journal of Applied Physics, Vol. 83, Núm. 11, pp. 6182-6184
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Modeling of the ion mass effect on transient enhanced diffusion: Deviation from the "+1" model
Applied Physics Letters, Vol. 73, Núm. 10, pp. 1421-1423
1997
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Boron-Enhanced-Diffusion of boron: The limiting factor for ultra-shallow junctions
Technical Digest - International Electron Devices Meeting, IEDM