Fabrication of ta2o5 thin films by anodic oxidation of tantalum nitride and tantalum suicide: growing mechanisms, electrical characterization and ulsi m-i-m capacitor performances
- Duenas, S.
- Castan, H.
- Barbolla, J.
- Kola, R.R.
- Sullivan, P.A.
Konferenzberichte:
Materials Research Society Symposium - Proceedings
ISSN: 0272-9172
Datum der Publikation: 1999
Ausgabe: 567
Seiten: 371-378
Art: Artikel