Amorphous layer depth dependence on implant parameters during Si self-implantation

  1. Lopez, P.
  2. Pelaz, L.
  3. Marques, L.A.
  4. Barbolla, J.
  5. Gossmann, H.-J.L.
  6. Agarwal, A.
  7. Kimura, K.
  8. Matsushita, T.
Journal:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Year of publication: 2005

Volume: 124-125

Issue: SUPPL.

Pages: 379-382

Type: Conference paper

DOI: 10.1016/J.MSEB.2005.08.023 GOOGLE SCHOLAR