Elucidating the atomistic mechanisms driving self-diffusion of amorphous Si during annealing

  1. Santos, I.
  2. Marqués, L.A.
  3. Pelaz, L.
  4. Colombo, L.
Revue:
Physical Review B - Condensed Matter and Materials Physics

ISSN: 1098-0121,  1550-235X

Année de publication: 2011

Volumen: 83

Número: 15

Type: Article

DOI: 10.1103/PHYSREVB.83.153201 GOOGLE SCHOLAR lock_openUVADOC editor

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