Electrical characterization of high-k based metal-insulator-semiconductor structures with negative resistance effect when using Al2O 3 and nanolaminated films deposited on p-Si
- Gómez, A.
- Castán, H.
- García, H.
- Dueñas, S.
- Bailón, L.
- Campabadal, F.
- Rafí, J.M.
- Zabala, M.
ISSN: 2166-2754, 2166-2746
Year of publication: 2011
Volume: 29
Issue: 1
Type: Conference paper