Boron-Enhanced-Diffusion of boron: The limiting factor for ultra-shallow junctions

  1. Agarwal, Aditya
  2. Eaglesham, D.J.
  3. Gossmann, H.-J.
  4. Pelaz, L.
  5. Herner, S.B.
  6. Jacobson, D.C.
  7. Haynes, T.E.
  8. Erokhin, Y.
  9. Simonton, R.
Aktak:
Technical Digest - International Electron Devices Meeting, IEDM

ISSN: 0163-1918

Argitalpen urtea: 1997

Orrialdeak: 467-470

Mota: Biltzar ekarpena

DOI: 10.1109/IEDM.1997.650425 GOOGLE SCHOLAR

Garapen Iraunkorreko Helburuak