Carbon coatings with high concentrations of silicon deposited by RF PECVD method at relatively high self-bias

  1. Jedrzejczak, A.
  2. Batory, D.
  3. Dominik, M.
  4. Smietana, M.
  5. Cichomski, M.
  6. Szymanski, W.
  7. Bystrzycka, E.
  8. Prowizor, M.
  9. Kozlowski, W.
  10. Dudek, M.
Aldizkaria:
Surface and Coatings Technology

ISSN: 0257-8972

Argitalpen urtea: 2017

Alea: 329

Orrialdeak: 212-217

Mota: Artikulua

DOI: 10.1016/J.SURFCOAT.2017.09.044 GOOGLE SCHOLAR