Publikationen, an denen er mitarbeitet Peter A. Stolk (5)

1999

  1. Cluster ripening and transient enhanced diffusion in silicon

    Materials Science in Semiconductor Processing, Vol. 2, Núm. 4, pp. 369-376

  2. Energetics of self-interstitial clusters in si

    Physical Review Letters, Vol. 82, Núm. 22, pp. 4460-4463

  3. Ostwald ripening of {113} defects precursors and transient enhanced diffusion

    Materials Research Society Symposium - Proceedings, Vol. 568, pp. 163-168

1997

  1. Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon

    Journal of Applied Physics, Vol. 81, Núm. 9, pp. 6031-6050

1995

  1. Ion implantation and transient enhanced diffusion

    Technical Digest - International Electron Devices Meeting