Jesus Manuel Hernandez Mangas-rekin lankidetzan egindako argitalpenak (4)

2005

  1. Boron redistribution in pre-amorphized Si during thermal annealing

    2005 Spanish Conference on Electron Devices, Proceedings

  2. Damage buildup model with dose rate and temperature dependence

    2005 Spanish Conference on Electron Devices, Proceedings

  3. Dose-rate and temperature dependent statistical damage accumulation model for ion implantation into silicon

    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

2001

  1. Stability of defects in crystalline silicon and their role in amorphization

    Physical Review B - Condensed Matter and Materials Physics, Vol. 64, Núm. 4