Integrated atomistic process and device simulation of decananometre MOSFETs

  1. Asenov, A.
  2. Jaraiz, M.
  3. Roy, S.
  4. Roy, G.
  5. Adamu-Lema, F.
  6. Brown, A.R.
  7. Moroz, V.
  8. Gafiteanu, R.
Actes de conférence:
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

ISBN: 4891140275

Année de publication: 2002

Volumen: 2002-January

Pages: 87-90

Type: Communication dans un congrès

DOI: 10.1109/SISPAD.2002.1034523 GOOGLE SCHOLAR