Atomistic modeling of deactivation and reactivation mechanisms in high-concentration boron profiles

  1. Aboy, M.
  2. Pelaz, L.
  3. Marqués, L.A.
  4. Barbolla, J.
  5. Mokhberi, A.
  6. Takamura, Y.
  7. Griffin, P.B.
  8. Plummer, J.D.
Revue:
Applied Physics Letters

ISSN: 0003-6951

Année de publication: 2003

Volumen: 83

Número: 20

Pages: 4166-4168

Type: Article

DOI: 10.1063/1.1628391 GOOGLE SCHOLAR

Objectifs de Développement Durable