Dose loss and segregation of boron and arsenic at the Si/SiO2 interface by atomistic kinetic Monte Carlo simulations

  1. Rubio, J.E.
  2. Jaraiz, M.
  3. Martin-Bragado, I.
  4. Castrillo, P.
  5. Pinacho, R.
  6. Barbolla, J.
Aldizkaria:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Argitalpen urtea: 2005

Alea: 124-125

Zenbakia: SUPPL.

Orrialdeak: 392-396

Mota: Biltzar ekarpena

DOI: 10.1016/J.MSEB.2005.08.030 GOOGLE SCHOLAR