Dose loss and segregation of boron and arsenic at the Si/SiO2 interface by atomistic kinetic Monte Carlo simulations
- Rubio, J.E.
- Jaraiz, M.
- Martin-Bragado, I.
- Castrillo, P.
- Pinacho, R.
- Barbolla, J.
ISSN: 0921-5107
Année de publication: 2005
Volumen: 124-125
Número: SUPPL.
Pages: 392-396
Type: Communication dans un congrès