Design and optimization of nanoCMOS devices using predictive atomistic physics-based process modeling

  1. Colombeau, B.
  2. Mok, K.R.C.
  3. Yeong, S.H.
  4. Bénistant, F.
  5. Indajang, B.
  6. Tan, O.
  7. Yang, B.
  8. Li, Y.
  9. Jaraiz, M.
  10. Cowern, N.E.B.
  11. Chu, S.
Konferenzberichte:
Technical Digest - International Electron Devices Meeting, IEDM

ISSN: 0163-1918

ISBN: 9781424404391

Datum der Publikation: 2006

Art: Konferenz-Beitrag

DOI: 10.1109/IEDM.2006.346790 GOOGLE SCHOLAR