Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2 O3, HfO2, and nanolaminates on different silicon substrates

1. Campabadal, F.
2. Rafí, J.M.
3. Zabala, M.
4. Beldarrain, O.
5. Faigón, A.
6. Castán, H.
7. Gómez, A.
8. García, H.
9. Dueas, S.