2 MeV electron irradiation effects on bulk and interface of atomic layer deposited high-k gate dielectrics on silicon

  1. García, H.
  2. Castán, H.
  3. Dueñas, S.
  4. Bailón, L.
  5. Campabadal, F.
  6. Rafí, J.M.
  7. Zabala, M.
  8. Beldarrain, O.
  9. Ohyama, H.
  10. Takakura, K.
  11. Tsunoda, I.
Revue:
Thin Solid Films

ISSN: 0040-6090

Année de publication: 2013

Volumen: 534

Pages: 482-487

Type: Article

DOI: 10.1016/J.TSF.2013.02.004 GOOGLE SCHOLAR