Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing
- García, H.
- Castán, H.
- Dueñas, S.
- Bailón, L.
- Campabadal, F.
- Beldarrain, O.
- Zabala, M.
- González, M.B.
- Rafí, J.M.
Zeitschrift:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
ISSN: 0734-2101
Datum der Publikation: 2013
Ausgabe: 31
Nummer: 1
Art: Artikel