Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing

1. García, H.
2. Castán, H.
3. Dueñas, S.
4. Bailón, L.
5. Campabadal, F.
6. Beldarrain, O.
7. Zabala, M.
8. González, M.B.
9. Rafí, J.M.