Study from cryogenic to high temperatures of the high- and low-resistance-state currents of ReRAM Ni-HfO2-Si capacitors

  1. Vaca, C.
  2. Gonzalez, M.B.
  3. Castan, H.
  4. Garcia, H.
  5. Duenas, S.
  6. Campabadal, F.
  7. Miranda, E.
  8. Bailon, L.A.
Aldizkaria:
IEEE Transactions on Electron Devices

ISSN: 0018-9383

Argitalpen urtea: 2016

Alea: 63

Zenbakia: 5

Orrialdeak: 1877-1883

Mota: Artikulua

DOI: 10.1109/TED.2016.2546898 GOOGLE SCHOLAR