Comparative Equilibrium Analysis of Metalorganic Chemical Vapor Deposition (MOCVD) GaAs Growth Using Trimethylgallium (TMGa) with Arsine or Trimethylarsine (TMAs)

  1. Abril, E.J.
  2. Aguilar, M.
  3. Alonso, A.
  4. Lopez, M.
Aldizkaria:
Japanese Journal of Applied Physics

ISSN: 1347-4065,  0021-4922

Argitalpen urtea: 1992

Alea: 31

Zenbakia: 6 R

Orrialdeak: 1721-1725

Mota: Artikulua

DOI: 10.1143/JJAP.31.1721 GOOGLE SCHOLAR