Comparative Equilibrium Analysis of Metalorganic Chemical Vapor Deposition (MOCVD) GaAs Growth Using Trimethylgallium (TMGa) with Arsine or Trimethylarsine (TMAs)

  1. Abril, E.J.
  2. Aguilar, M.
  3. Alonso, A.
  4. Lopez, M.
Revue:
Japanese Journal of Applied Physics

ISSN: 1347-4065,  0021-4922

Année de publication: 1992

Volumen: 31

Número: 6 R

Pages: 1721-1725

Type: Article

DOI: 10.1143/JJAP.31.1721 GOOGLE SCHOLAR