Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon

1. Stolk, P.A.
2. Gossmann, H.-J.
3. Eaglesham, D.J.
4. Jacobson, D.C.
5. Rafferty, C.S.
6. Gilmer, G.H.
7. Jaraíz, M.
8. Poate, J.M.
9. Luftman, H.S.
10. Haynes, T.E.