Atomistic modeling of B activation and deactivation for ultra-shallow junction formation
- Aboy, M.
- Pelaz, L.
- Marqués, L.A.
- Barbolla, J.
- Mokhberi, A.
- Takamura, Y.
- Griffin, P.B.
- Plummer, J.D.
Proceedings:
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
ISBN: 0780378261
Year of publication: 2003
Volume: 2003-January
Pages: 151-154
Type: Conference paper