Grupo de Caracterización de Materiales y Dispositivos Electrónicos ( Electronic Materials and Devices Characterization Group, GCME)
University of Helsinki
Helsinki, FinlandiaPublicaciones en colaboración con investigadores/as de University of Helsinki (51)
2021
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Analysis of the performance of Nb2O5-doped SiO2-based MIM devices for memory and neural computation applications
Solid-State Electronics, Vol. 186
2020
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Double Swing Quiescent-Current: An Experimental Detection Method of Ferroelectricity in Very Leaky Dielectric Films
ECS Transactions
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Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 38, Núm. 4
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Silicon oxide-niobium oxide mixture films and nanolaminates grown by atomic layer deposition from niobium pentaethoxide and hexakis(ethylamino) disilane
Nanotechnology, Vol. 31, Núm. 19
2019
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Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates
Thin Solid Films, Vol. 669, pp. 294-300
2018
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Atomic layer deposition and properties of HFO 2 -Al 2 O 3 nanolaminates
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 9, pp. P501-P508
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Electric and magnetic properties of atomic layer deposited ZrO 2 -HfO 2 thin films
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 9, pp. N117-N122
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Admittance memory cycles of Ta2O5-ZrO2-based RRAM devices
2017 32nd Conference on Design of Circuits and Integrated Systems, DCIS 2017 - Proceedings
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Atomic layer deposition and performance of ZrO2-Al2O3 thin films
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 5, pp. P287-P294
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Atomic layer deposition and properties of ZrO2/Fe2O3 thin films
Beilstein Journal of Nanotechnology, Vol. 9, Núm. 1, pp. 119-128
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Atomic layer deposition of zirconium dioxide from zirconium tetraiodide and ozone
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 2, pp. P1-P8
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Memory maps: Reading RRAM devices without power consumption
ECS Transactions
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Properties of atomic layer deposited nanolaminates of zirconium and cobalt oxides
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 8, pp. P402-P409
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Study of the influence of the dielectric composition of Al/Ti/ZrO2:Al2O3/TiN/Si/Al structures on the resistive switching behavior for memory applications
ECS Transactions
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The Role of Defects in the Resistive Switching Behavior of Ta2O5-TiO2-Based Metal–Insulator–Metal (MIM) Devices for Memory Applications
Journal of Electronic Materials
2017
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Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
ACS Omega, Vol. 2, Núm. 12, pp. 8836-8842
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Properties of zirconium oxide and cobalt ferrite layered nanocomposite
ECS Journal of Solid State Science and Technology, Vol. 6, Núm. 12, pp. P886-P892
2016
2015
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Atomic layer deposition and characterization of dysprosium-doped zirconium oxide thin films
Chemical Vapor Deposition, Vol. 21, Núm. 7-9, pp. 181-187
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Charge and current hysteresis in dysprosium-doped zirconium oxide thin films
Microelectronic Engineering, Vol. 147, pp. 55-58