Publikationen in Zusammenarbeit mit Forschern von Nokia Foundation (2)

2006

  1. InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

    Materials Science in Semiconductor Processing, Vol. 9, Núm. 1-3, pp. 225-229

  2. InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

    Conference Proceedings - International Conference on Indium Phosphide and Related Materials