Nokia Foundation-ko ikertzaileekin lankidetzan egindako argitalpenak (2)

2006

  1. InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

    Materials Science in Semiconductor Processing, Vol. 9, Núm. 1-3, pp. 225-229

  2. InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

    Conference Proceedings - International Conference on Indium Phosphide and Related Materials