Publicaciones en colaboración con investigadores/as de Nokia Foundation (19)

2022

  1. Secure File Systems for the Development of a Data Leak Protection (DLP) Tool Against Internal Threats

    Iberian Conference on Information Systems and Technologies, CISTI

  2. Survey of Techniques on Data Leakage Protection and Methods to address the Insider threat

    Cluster Computing, Vol. 25, Núm. 6, pp. 4289-4302

2009

  1. User-centric future internet and telecommunication services

    Towards the Future Internet: A European Research Perspective (IOS Press), pp. 217-226

2006

  1. InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

    Materials Science in Semiconductor Processing, Vol. 9, Núm. 1-3, pp. 225-229

  2. InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

    Conference Proceedings - International Conference on Indium Phosphide and Related Materials

2004

  1. Effect of the p+-GaAs contact layer doping level on the gradual degradation of InGaAs/AlGaAs pump lasers

    EPJ Applied Physics

2003

  1. Direct evidence for group III atoms migration in aged 980 nm InGaAs/AlGaAs pump lasers

    Physica Status Solidi (A) Applied Research

2002

  1. Design fabrication, and evaluation of an internally cooled silicon carbide mirror

    Review of Scientific Instruments

2000

  1. Analysis of grain orientation and intergrain properties by micro-Raman spectroscopy in YBa2Cu3O7-x thin films

    Journal of Materials Research, Vol. 15, Núm. 5, pp. 1069-1075

  2. Dominant iron gettering mechanism in p/p+ silicon wafers

    Applied Physics Letters, Vol. 77, Núm. 2, pp. 241-243

1999

  1. Atomistic simulations of ion implantation and diffusion

    International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

  2. Boron pileup and clustering in silicon-on-insulator films

    Applied Physics Letters, Vol. 75, Núm. 8, pp. 1083-1085

  3. Passivation of the Facets of 980 nm GaAs Pump Lasers by a Pulsed UV Laser-Assisted Technique

    Journal of Electronic Materials, Vol. 28, Núm. 2, pp. 83-90

1997

  1. Atomistic model of transient enhanced diffusion and clustering of boron in silicon

    Materials Research Society Symposium - Proceedings

  2. Boron-Enhanced-Diffusion of boron: The limiting factor for ultra-shallow junctions

    Technical Digest - International Electron Devices Meeting, IEDM

  3. Thin film resistors and capacitors for advanced packaging

    Proceedings of the International Symposium and Exhibition on Advanced Packaging Materials Processes, Properties and Interfaces, pp. 71-74

1996

  1. A microraman study of the structural properties of PLD high Tc superconducting thin films

    Physica C: Superconductivity and its Applications, Vol. 270, Núm. 1-2, pp. 144-154

  2. Oxygen content of YBaCuO thin films

    Physica C: Superconductivity and its Applications, Vol. 256, Núm. 3-4, pp. 291-297

1995

  1. Raman microprobe analysis of patterned high Tc superconductor (YBCO) thin films

    Materials Research Bulletin, Vol. 30, Núm. 6, pp. 771-778