Publicaciones en colaboración con investigadores/as de Philips Research Eindhoven (32)

2019

  1. Epithelial dysregulation in obese severe asthmatics with gastro-oesophageal reflux

    European Respiratory Journal

2018

  1. A computational framework for complex disease stratification from multiple large-scale datasets

    BMC Systems Biology, Vol. 12, Núm. 1

2016

  1. Changes in physical activity following a genetic-based internet-delivered personalized intervention: Randomized controlled trial (Food4Me)

    Journal of Medical Internet Research, Vol. 18, Núm. 2

  2. Objectively measured physical activity in European adults: Cross-sectional findings from the food4me study

    PLoS ONE, Vol. 11, Núm. 3

2015

  1. Design and baseline characteristics of the Food4Me study: a web-based randomised controlled trial of personalised nutrition in seven European countries

    Genes and Nutrition, Vol. 10, Núm. 1

  2. Effects of a web-based personalized intervention on physical activity in European adults:a randomized controlled trial

    Journal of Medical Internet Research, Vol. 17, Núm. 10

2008

  1. Atomistic modeling of impurity ion implantation in ultra-thin-body Si devices

    Technical Digest - International Electron Devices Meeting, IEDM

  2. Evolution of fluorine and boron profiles during annealing in crystalline Si

    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, Núm. 1, pp. 377-381

  3. F+ implants in crystalline Si: The Si interstitial contribution

    Materials Research Society Symposium Proceedings

  4. Si interstitial contribution of F+ implants in crystalline Si

    Journal of Applied Physics, Vol. 103, Núm. 9

2006

  1. Boron pocket and channel deactivation in nMOS transistors with SPER junctions

    IEEE Transactions on Electron Devices, Vol. 53, Núm. 1, pp. 71-76

  2. Fluorine profile distortion upon annealing by the presence of a CVD grown boron box

    AIP Conference Proceedings

  3. Physical insight into boron activation and redistribution during annealing after low-temperature solid phase epitaxial regrowth

    Applied Physics Letters, Vol. 88, Núm. 19

2005

  1. Atomistic analysis of the evolution of boron activation during annealing in crystalline and preamorphized silicon

    Journal of Applied Physics, Vol. 97, Núm. 10

  2. Boron activation and redistribution during thermal treatments after solid phase epitaxial regrowth

    Materials Science and Engineering B: Solid-State Materials for Advanced Technology

  3. Boron diffusion in amorphous silicon

    Materials Science and Engineering B: Solid-State Materials for Advanced Technology

  4. Boron redistribution in pre-amorphized Si during thermal annealing

    2005 Spanish Conference on Electron Devices, Proceedings

  5. E-MRS 2005/Symposium D: Materials science and device issues for future Si-based technologies

    Materials Science and Engineering B: Solid-State Materials for Advanced Technology

  6. Effect of amorphization on activation and deactivation of boron in source/drain, channel and poly gate

    Meeting Abstracts

  7. Effect of amorphization on activation and deactivation of boron in source/drain, channel and polygate

    Proceedings - Electrochemical Society