The role of silicon interstitials in the deactivation and reactivation of high concentration boron profiles

  1. Aboy, M.
  2. Pelaz, L.
  3. Marqués, L.A.
  4. Löpez, P.
  5. Barbolla, J.
  6. Venezia, V.C.
  7. Duffy, R.
  8. Griffin, P.B.
Revue:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Année de publication: 2004

Volumen: 114-115

Número: SPEC. ISS.

Pages: 193-197

Type: Communication dans un congrès

DOI: 10.1016/J.MSEB.2004.07.056 GOOGLE SCHOLAR