The role of silicon interstitials in the deactivation and reactivation of high concentration boron profiles

  1. Aboy, M.
  2. Pelaz, L.
  3. Marqués, L.A.
  4. Löpez, P.
  5. Barbolla, J.
  6. Venezia, V.C.
  7. Duffy, R.
  8. Griffin, P.B.
Revista:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Ano de publicación: 2004

Volume: 114-115

Número: SPEC. ISS.

Páxinas: 193-197

Tipo: Achega congreso

DOI: 10.1016/J.MSEB.2004.07.056 GOOGLE SCHOLAR