Atomistic analysis of the evolution of boron activation during annealing in crystalline and preamorphized silicon

  1. Aboy, M.
  2. Pelaz, L.
  3. Marqús, L.A.
  4. López, P.
  5. Barbolla, J.
  6. Duffy, R.
Revista:
Journal of Applied Physics

ISSN: 0021-8979

Ano de publicación: 2005

Volume: 97

Número: 10

Tipo: Artigo

DOI: 10.1063/1.1904159 GOOGLE SCHOLAR