Electrical Characterization of Defects Created by γ-Radiation in HfO2-Based MIS Structures for RRAM Applications

1. García, H.
2. González, M.B.
3. Mallol, M.M.
4. Castán, H.
5. Dueñas, S.
6. Campabadal, F.
7. Acero, M.C.
8. Sambuco Salomone, L.
9. Faigón, A.

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DOI: 10.1007/S11664-018-6257-Y GOOGLE SCHOLAR lock_openUVADOC editor