Electrical Characterization of Defects Created by γ-Radiation in HfO2-Based MIS Structures for RRAM Applications

  1. García, H.
  2. González, M.B.
  3. Mallol, M.M.
  4. Castán, H.
  5. Dueñas, S.
  6. Campabadal, F.
  7. Acero, M.C.
  8. Sambuco Salomone, L.
  9. Faigón, A.
Revue:
Journal of Electronic Materials

ISSN: 0361-5235

Année de publication: 2018

Volumen: 47

Número: 9

Pages: 5013-5018

Type: Communication dans un congrès

DOI: 10.1007/S11664-018-6257-Y GOOGLE SCHOLAR lock_openUVADOC editor