Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method

  1. Jedrzejczak, A.
  2. Batory, D.
  3. Prowizor, M.
  4. Dominik, M.
  5. Smietana, M.
  6. Cichomski, M.
  7. Kisielewska, A.
  8. Szymanski, W.
  9. Kozlowski, W.
  10. Dudek, M.
Revista:
Thin Solid Films

ISSN: 0040-6090

Any de publicació: 2020

Volum: 693

Tipus: Article

DOI: 10.1016/J.TSF.2019.137697 GOOGLE SCHOLAR