Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method

  1. Jedrzejczak, A.
  2. Batory, D.
  3. Prowizor, M.
  4. Dominik, M.
  5. Smietana, M.
  6. Cichomski, M.
  7. Kisielewska, A.
  8. Szymanski, W.
  9. Kozlowski, W.
  10. Dudek, M.
Journal:
Thin Solid Films

ISSN: 0040-6090

Year of publication: 2020

Volume: 693

Type: Article

DOI: 10.1016/J.TSF.2019.137697 GOOGLE SCHOLAR