Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method

  1. Jedrzejczak, A.
  2. Batory, D.
  3. Prowizor, M.
  4. Dominik, M.
  5. Smietana, M.
  6. Cichomski, M.
  7. Kisielewska, A.
  8. Szymanski, W.
  9. Kozlowski, W.
  10. Dudek, M.
Aldizkaria:
Thin Solid Films

ISSN: 0040-6090

Argitalpen urtea: 2020

Alea: 693

Mota: Artikulua

DOI: 10.1016/J.TSF.2019.137697 GOOGLE SCHOLAR