Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method

  1. Jedrzejczak, A.
  2. Batory, D.
  3. Prowizor, M.
  4. Dominik, M.
  5. Smietana, M.
  6. Cichomski, M.
  7. Kisielewska, A.
  8. Szymanski, W.
  9. Kozlowski, W.
  10. Dudek, M.
Revista:
Thin Solid Films

ISSN: 0040-6090

Ano de publicación: 2020

Volume: 693

Tipo: Artigo

DOI: 10.1016/J.TSF.2019.137697 GOOGLE SCHOLAR