Physical modeling and implementation scheme of native defect diffusion and interdiffusion in SiGe heterostructures for atomistic process simulation

  1. Castrillo, P.
  2. Pinacho, R.
  3. Jaraiz, M.
  4. Rubio, J.E.
Aldizkaria:
Journal of Applied Physics

ISSN: 0021-8979

Argitalpen urtea: 2011

Alea: 109

Zenbakia: 10

Mota: Biltzar ekarpena

DOI: 10.1063/1.3581113 GOOGLE SCHOLAR