Physical modeling and implementation scheme of native defect diffusion and interdiffusion in SiGe heterostructures for atomistic process simulation

  1. Castrillo, P.
  2. Pinacho, R.
  3. Jaraiz, M.
  4. Rubio, J.E.
Revista:
Journal of Applied Physics

ISSN: 0021-8979

Ano de publicación: 2011

Volume: 109

Número: 10

Tipo: Achega congreso

DOI: 10.1063/1.3581113 GOOGLE SCHOLAR