Physical modeling and implementation scheme of native defect diffusion and interdiffusion in SiGe heterostructures for atomistic process simulation

  1. Castrillo, P.
  2. Pinacho, R.
  3. Jaraiz, M.
  4. Rubio, J.E.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 2011

Volumen: 109

Número: 10

Type: Communication dans un congrès

DOI: 10.1063/1.3581113 GOOGLE SCHOLAR