Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition

  1. Kukli, K.
  2. Aarik, L.
  3. Vinuesa, G.
  4. Dueñas, S.
  5. Castán, H.
  6. García, H.
  7. Kasikov, A.
  8. Ritslaid, P.
  9. Piirsoo, H.-M.
  10. Aarik, J.
Revue:
Materials

ISSN: 1996-1944

Année de publication: 2022

Volumen: 15

Número: 3

Type: Article

DOI: 10.3390/MA15030877 GOOGLE SCHOLAR lock_openAccès ouvert editor