Inhomogeneous HfO2layer growth at atomic layer deposition

  1. Kasikov, A.
  2. Tarre, A.
  3. Vinuesa, G.
Journal:
Journal of Electrical Engineering

ISSN: 1339-309X,  1335-3632

Year of publication: 2023

Volume: 74

Issue: 4

Pages: 246-255

Type: Article

DOI: 10.2478/JEE-2023-0031 GOOGLE SCHOLAR lock_openOpen access editor