Inhomogeneous HfO2layer growth at atomic layer deposition

  1. Kasikov, A.
  2. Tarre, A.
  3. Vinuesa, G.
Revue:
Journal of Electrical Engineering

ISSN: 1339-309X,  1335-3632

Année de publication: 2023

Volumen: 74

Número: 4

Pages: 246-255

Type: Article

DOI: 10.2478/JEE-2023-0031 GOOGLE SCHOLAR lock_openAccès ouvert editor