Publicaciones en las que colabora con Salvador Dueñas Carazo (12)
1999
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Electrical characterization of ECR enhaced deposited silicon nitride bilayers for high quality Al/SiNx/InP MIS structure fabrication
Journal of Materials Science: Materials in Electronics, Vol. 10, Núm. 5, pp. 373-377
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Electrical characterization of He-ion implantation-induced deep levels in p+n InP junctions
Journal of Applied Physics, Vol. 86, Núm. 9, pp. 4855-4860
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Electrical characterization of a He ion implantation-induced deep level existing in p+n InP junctions
Journal of Applied Physics, Vol. 85, Núm. 11, pp. 7978-7980
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Electrical characterization of deep levels existing in fully implanted and rapid thermal annealed p+n InP junctions
Journal of Materials Science: Materials in Electronics, Vol. 10, Núm. 5, pp. 413-418
1998
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Electrical characterization of deep levels existing in Mg-Si- and Mg-P-Si-implanted p+n InP junctions
Semiconductor Science and Technology, Vol. 13, Núm. 4, pp. 389-393
1997
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Deep levels in p+-n junctions fabricated by rapid thermal annealing of Mg or Mg/P implanted InP
Journal of Applied Physics, Vol. 81, Núm. 7, pp. 3143-3150
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Detailed electrical characterization of DX centers in Se-doped AlxGa1-xAs
Journal of Applied Physics, Vol. 82, Núm. 9, pp. 4338-4345
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Experimental observation of conductance transients in Al/SiNx:H/Si metal-insulator-semiconductor structures
Applied Physics Letters, Vol. 71, Núm. 6, pp. 826-828
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Thermal emission processes of DX centres in AlxGa1-xAs:Si
Solid-State Electronics, Vol. 41, Núm. 1, pp. 103-109
1996
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Determination of three-dimensional deep level defect distribution by capacitance-voltage transient technique (CVTT)
DEFECT RECOGNITION AND IMAGE PROCESSING IN SEMICONDUCTORS 1995
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Dopant level freeze-out and nonideal effects in 6H-SiC epilayer junctions
Journal of Applied Physics, Vol. 79, Núm. 1, pp. 310-315
1995
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Ability of capacitance–voltage transient technique to study spatial distribution and electric field dependence of emission properties of deep levels in semiconductors
Materials Science and Technology (United Kingdom), Vol. 11, Núm. 10, pp. 1074-1078