Conductance transient, capacitance-voltage and deep-level transient spectroscopy characterization of atomic layer deposited hafnium and zirconium oxide thin films

  1. Dueñas, S.
  2. Castán, H.
  3. Barbolla, J.
  4. Kukli, K.
  5. Ritala, M.
  6. Leskelä, M.
Revue:
Solid-State Electronics

ISSN: 0038-1101

Année de publication: 2003

Volumen: 47

Número: 10

Pages: 1623-1629

Type: Communication dans un congrès

DOI: 10.1016/S0038-1101(03)00172-2 GOOGLE SCHOLAR